SKU:78748245137
Cu Film on Ta/SiO2/ Silicon Wafer, Cu=400 nm Ta=50nm SiO2=300nm, Si(100) P-type B-doped5x5x0.525mm, 1sp
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Ships within 48 hours · Estimated delivery Jul 14 - Jul 19
Description
Cu Film on Ta/SiO2/ Silicon Wafer, Cu=400 nm Ta=50nm SiO2=300nm, Si(100) P-type B-doped5x5x0.525mm, 1spSpecifications: Cu coated SiO2 Si Wafer (5x5 mm size) Thickness of polycrystalline Cu <111> film: 400 nm Thickness of Ta diffusion barrier: 50 nm 5x5x0. 5 mm SiO2 Si wafer (Prime Grade) P type, B doped, <100> orientation, SSP Resistivities: 1 20 ohm cm thermal oxide: 300 nm Surface Roughness: as grown Package: One 1000 class clean room with 100 class plastic bag 10 pcs per package for minimum order
vacuum or inert gas)
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Aluminum Metallic Film
Package: 100 g per lot sealed in Plastic bag
centrifugal fan blower
Thickness of Cu polycrystalline <111> film: 100 nm
Wafer Container
Au(Gold) Single Crystal Substrate
Part Number EQ-SC0604 Arbor Dia 0
Conductor type: Semi-insulating
Input Voltage / Power
Mobility: 4470-6540 cm^2/V
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