Fused Silica substrate , 1" x 1" x1.0 mm, 2 sides polished - SOF252510S2

Fused Silica substrate , 1" x 1" x1.0 mm, 2 sides polished - SOF252510S2Fused Silica substrate Size: 1'' x 1'' x 1. 0 mm Polishing: Both sides polished Surface Roughness: < 5A, RMS Related products: Other Fused Silica Substrates BK7 Glass FTO Glass ITO Coated Glass

Air dry at room temperature for 2 hours then final cure at 200 for 2 hours before placing in operation

Current upper & lower limit

Boiling Point:         2856 °C

Battery analyzers with 8 channels are not included in the package

24mm (for electrode and separator discs of CR24xx series)

Moisture Vapor/O2 Transmission Rate 200ppm / 5 years

Chemical Resistance

AC 110V Single Phase or AC 220V Single Phase can be selected in the option bar

Sapphire (single crystal of Al2O3 ) is being used extensively as a substrate for III-V nitrides and for many other epitaxial films

Dew Point: -40ºC (~ 79 ppm) under the condition that has no de-gas or de-vapor equipment inside and measures in the center of the dry room with one operator

opening 26mm)

P/N Description Qty UP820-01 Aluminum alloy master plate 8" dia lapping plate 2 set UP820-02 8" dia