Diamond on Oxide Wafer(DOI), 5 mm x 5 mm, 2um Thick, 10nm Ra

Diamond on Oxide Wafer(DOI), 5 mm x 5 mm, 2um Thick, 10nm RaSpecifications: Film: UNCD (Ultrananocrystalline Diamond) Wafer Size: 5x5x0. 5mm Si wafer Orientation: (100) + 0. 5o Insulating Layer: SiO2 Diamond film thickness: 2 microns, undoped Oxide Layer: 1 micron Estimated Resistivity: ~ 10E5 ohm cm Surface Roughness: as grown , RA < 10 nm Package: One 1000 class clean room with 100 class plastic bag

After perfectly crimping

This electrode strip is composed by coating Lithium-Manganese Oxide on both sides of Aluminum foil

For CR2450 coin cells

also called L927

995 alumina tube proves inert to carbon and refractory metals in many severe situations:

Optional Parts

Array (Capacity):   6*8=48

Compliance Vacuum gauge is ETL certified

This Copper Mesh Foil (11um)  is used as a substrate for coating anode materials in Li-Ion battery research

Package:                           under 1000 class clean room

Dimension: 230 mm L x 80 mm W x 32 mm H

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